School of Physics - Research Publications

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    Controlled single electron transfer between Si:P dots
    Buehler, TM ; Chan, V ; Ferguson, AJ ; Dzurak, AS ; Hudson, FE ; Reilly, DJ ; Hamilton, AR ; Clark, RG ; Jamieson, DN ; Yang, C ; Pakes, CI ; Prawer, S (AMER INST PHYSICS, 2006-05-08)
    We demonstrate electrical control of Si:P double dots in which the potential is defined by nanoscale phosphorus-doped regions. Each dot contains approximately 600 phosphorus atoms and has a diameter close to 30nm. On application of a differential bias across the dots, electron transfer is observed, using single electron transistors in both dc and rf modes as charge detectors. With the possibility to scale the dots down to a few and even single atoms these results open the way to a new class of precision-doped quantum dots in silicon.
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    The effect of ion implantation on thermally stimulated currents in polycrystalline CVD diamond
    Trajkov, E ; Prawer, S ; Spizzirri, P (ELSEVIER SCIENCE SA, 2003-01-01)
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    Stark shift control of single optical centers in diamond
    Tamarat, P ; Gaebel, T ; Rabeau, JR ; Khan, M ; Greentree, AD ; Wilson, H ; Hollenberg, LCL ; Prawer, S ; Hemmer, P ; Jelezko, F ; Wrachtrup, J (AMERICAN PHYSICAL SOC, 2006-08-25)
    Lifetime-limited optical excitation lines of single nitrogen-vacancy (NV) defect centers in diamond have been observed at liquid helium temperature. They display unprecedented spectral stability over many seconds and excitation cycles. Spectral tuning of the spin-selective optical resonances was performed via the application of an external electric field (i.e., the Stark shift). A rich variety of Stark shifts were observed including linear as well as quadratic components. The ability to tune the excitation lines of single NV centers has potential applications in quantum information processing.
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    Critical components for diamond-based quantum coherent devices
    Greentree, AD ; Olivero, P ; Draganski, M ; Trajkov, E ; Rabeau, JR ; Reichart, P ; Gibson, BC ; Rubanov, S ; Huntington, ST ; Jamieson, DN ; Prawer, S (IOP PUBLISHING LTD, 2006-05-31)
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    Coherent population trapping of single spins in diamond under optical excitation
    Santori, C ; Tamarat, P ; Neumann, P ; Wrachtrup, J ; Fattal, D ; Beausoleil, RG ; Rabeau, J ; Olivero, P ; Greentree, AD ; Prawer, S ; Jelezko, F ; Hemmer, P (AMER PHYSICAL SOC, 2006-12-15)
    Coherent population trapping is demonstrated in single nitrogen-vacancy centers in diamond under optical excitation. For sufficient excitation power, the fluorescence intensity drops almost to the background level when the laser modulation frequency matches the 2.88 GHz splitting of the ground states. The results are well described theoretically by a four-level model, allowing the relative transition strengths to be determined for individual centers. The results show that all-optical control of single spins is possible in diamond.
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    Progress in silicon-based quantum computing
    Clark, RG ; Brenner, R ; Buehler, TM ; Chan, V ; Curson, NJ ; Dzurak, AS ; Gauja, E ; Goan, HS ; Greentree, AD ; Hallam, T ; Hamilton, AR ; Hollenberg, LCL ; Jamieson, DN ; McCallum, JC ; Milburn, GJ ; O'Brien, JL ; Oberbeck, L ; Pakes, CI ; Prawer, SD ; Reilly, DJ ; Ruess, FJ ; Schofield, SR ; Simmons, MY ; Stanley, FE ; Starrett, RP ; Wellard, C ; Yang, C ; Knight, PL ; Hinds, EA ; Plenio, MB (ROYAL SOC, 2003-07-15)
    We review progress at the Australian Centre for Quantum Computer Technology towards the fabrication and demonstration of spin qubits and charge qubits based on phosphorus donor atoms embedded in intrinsic silicon. Fabrication is being pursued via two complementary pathways: a 'top-down' approach for near-term production of few-qubit demonstration devices and a 'bottom-up' approach for large-scale qubit arrays with sub-nanometre precision. The 'top-down' approach employs a low-energy (keV) ion beam to implant the phosphorus atoms. Single-atom control during implantation is achieved by monitoring on-chip detector electrodes, integrated within the device structure. In contrast, the 'bottom-up' approach uses scanning tunnelling microscope lithography and epitaxial silicon overgrowth to construct devices at an atomic scale. In both cases, surface electrodes control the qubit using voltage pulses, and dual single-electron transistors operating near the quantum limit provide fast read-out with spurious-signal rejection.
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    Controlled shallow single-ion implantation in silicon using an active substrate for sub-20-keV ions
    Jamieson, DN ; Yang, C ; Hopf, T ; Hearne, SM ; Pakes, CI ; Prawer, S ; Mitic, M ; Gauja, E ; Andresen, SE ; Hudson, FE ; Dzurak, AS ; Clark, RG (AMER INST PHYSICS, 2005-05-16)
    We demonstrate a method for the controlled implantation of single ions into a silicon substrate with energy of sub-20-keV. The method is based on the collection of electron-hole pairs generated in the substrate by the impact of a single ion. We have used the method to implant single 14-keV P31 ions through nanoscale masks into silicon as a route to the fabrication of devices based on single donors in silicon.