Dopant diffusion during optical fibre drawing
Author
Lyytikainen, K; Huntington, ST; Carter, ALG; McNamara, P; Fleming, S; Abramczyk, J; Kaplin, I; Schotz, GDate
2004-03-22Source Title
OPTICS EXPRESSPublisher
OPTICAL SOC AMERUniversity of Melbourne Author/s
Huntington, ShaneAffiliation
PhysicsMetadata
Show full item recordDocument Type
Journal ArticleCitations
Lyytikainen, K., Huntington, S. T., Carter, A. L. G., McNamara, P., Fleming, S., Abramczyk, J., Kaplin, I. & Schotz, G. (2004). Dopant diffusion during optical fibre drawing. OPTICS EXPRESS, 12 (6), pp.972-977. https://doi.org/10.1364/OPEX.12.000972.Access Status
This item is currently not available from this repositoryDescription
C1 - Journal Articles Refereed
Abstract
Diffusion of Ge and F was studied during drawing of silica optical fibres. Preforms were drawn using various draw conditions and fibres analysed using the etching and Atomic Force Microscope (AFM) technique. The results were confirmed by comparison with fibre Refractive Index Profiles (RIP). Both Ge and F were found to diffuse at high temperature, 2100 degrees C, and low draw speed, 10m/min. Diffusion simulations showed that most diffusion occurred in the neck-down region. The draw temperature and preform feed rate had a comparable effect on diffusion, whereas preform diameter did not significantly affect the diffusion.
Keywords
Nuclear and Particle Physics ; Physical SciencesExport Reference in RIS Format
Endnote
- Click on "Export Reference in RIS Format" and choose "open with... Endnote".
Refworks
- Click on "Export Reference in RIS Format". Login to Refworks, go to References => Import References