Dopant diffusion during optical fibre drawing

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    Author
    Lyytikainen, K; Huntington, ST; Carter, ALG; McNamara, P; Fleming, S; Abramczyk, J; Kaplin, I; Schotz, G
    Date
    2004-03-22
    Source Title
    OPTICS EXPRESS
    Publisher
    OPTICAL SOC AMER
    University of Melbourne Author/s
    Huntington, Shane
    Affiliation
    Physics
    Metadata
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    Document Type
    Journal Article
    Citations
    Lyytikainen, K., Huntington, S. T., Carter, A. L. G., McNamara, P., Fleming, S., Abramczyk, J., Kaplin, I. & Schotz, G. (2004). Dopant diffusion during optical fibre drawing. OPTICS EXPRESS, 12 (6), pp.972-977. https://doi.org/10.1364/OPEX.12.000972.
    Access Status
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    URI
    http://hdl.handle.net/11343/26207
    DOI
    10.1364/OPEX.12.000972
    Description

    C1 - Journal Articles Refereed
    Abstract
    Diffusion of Ge and F was studied during drawing of silica optical fibres. Preforms were drawn using various draw conditions and fibres analysed using the etching and Atomic Force Microscope (AFM) technique. The results were confirmed by comparison with fibre Refractive Index Profiles (RIP). Both Ge and F were found to diffuse at high temperature, 2100 degrees C, and low draw speed, 10m/min. Diffusion simulations showed that most diffusion occurred in the neck-down region. The draw temperature and preform feed rate had a comparable effect on diffusion, whereas preform diameter did not significantly affect the diffusion.
    Keywords
    Nuclear and Particle Physics ; Physical Sciences

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