Kinetics of arsenic-enhanced solid phase epitaxy in silicon

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    Author
    Johnson, BC; McCallum, JC
    Date
    2004-04-15
    Source Title
    JOURNAL OF APPLIED PHYSICS
    Publisher
    AMER INST PHYSICS
    University of Melbourne Author/s
    Johnson, Brett; McCallum, Jeffrey
    Affiliation
    Physics
    Metadata
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    Document Type
    Journal Article
    Citations
    Johnson, B. C. & McCallum, J. C. (2004). Kinetics of arsenic-enhanced solid phase epitaxy in silicon. JOURNAL OF APPLIED PHYSICS, 95 (8), pp.4427-4431. https://doi.org/10.1063/1.1682672.
    Access Status
    This item is currently not available from this repository
    URI
    http://hdl.handle.net/11343/26276
    DOI
    10.1063/1.1682672
    Description

    C1 - Journal Articles Refereed
    Keywords
    Condensed Matter Physics - Structural Properties ; Physical Sciences

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