Kinetics of arsenic-enhanced solid phase epitaxy in silicon
Author
Johnson, BC; McCallum, JCDate
2004-04-15Source Title
JOURNAL OF APPLIED PHYSICSPublisher
AMER INST PHYSICSAffiliation
PhysicsMetadata
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Journal ArticleCitations
Johnson, B. C. & McCallum, J. C. (2004). Kinetics of arsenic-enhanced solid phase epitaxy in silicon. JOURNAL OF APPLIED PHYSICS, 95 (8), pp.4427-4431. https://doi.org/10.1063/1.1682672.Access Status
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C1 - Journal Articles Refereed
Keywords
Condensed Matter Physics - Structural Properties ; Physical SciencesExport Reference in RIS Format
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