The crystallisation of deep amorphous wells in silicon produced by ion implantation

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    Author
    Liu, ACY; McCallum, JC; Wong-Leung, J
    Date
    2001-04-01
    Source Title
    Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
    Publisher
    ELSEVIER SCIENCE BV
    University of Melbourne Author/s
    McCallum, Jeffrey; LIU, AMELIA CHI YING
    Affiliation
    Physics
    Metadata
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    Document Type
    Journal Article
    Citations
    Liu, A. C. Y., McCallum, J. C. & Wong-Leung, J. (2001). The crystallisation of deep amorphous wells in silicon produced by ion implantation. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 175, pp.164-168. https://doi.org/10.1016/S0168-583X(01)00335-4.
    Access Status
    This item is currently not available from this repository
    URI
    http://hdl.handle.net/11343/26278
    DOI
    10.1016/S0168-583X(01)00335-4
    Description

    C1 - Journal Articles Refereed
    Keywords
    Nuclear and Particle Physics ; Physical Sciences

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