TY  - JOUR
AU  - Lyytikainen, K
AU  - Huntington, ST
AU  - Carter, ALG
AU  - McNamara, P
AU  - Fleming, S
AU  - Abramczyk, J
AU  - Kaplin, I
AU  - Schotz, G
Y2  - 2014/05/21
Y1  - 2004/03/22
SN  - 1094-4087
UR  - http://hdl.handle.net/11343/26207
AB  - Diffusion of Ge and F was studied during drawing of silica optical fibres. Preforms were drawn using various draw conditions and fibres analysed using the etching and Atomic Force Microscope (AFM) technique. The results were confirmed by comparison with fibre Refractive Index Profiles (RIP). Both Ge and F were found to diffuse at high temperature, 2100 degrees C, and low draw speed, 10m/min. Diffusion simulations showed that most diffusion occurred in the neck-down region. The draw temperature and preform feed rate had a comparable effect on diffusion, whereas preform diameter did not significantly affect the diffusion.
N1  - application/pdf
LA  - English
PB  - OPTICAL SOC AMER
KW  - Nuclear and Particle Physics ; Physical Sciences
T1  - Dopant diffusion during optical fibre drawing
DO  - 10.1364/OPEX.12.000972
IS  - OPTICS EXPRESS
VL  - 12
IS  - 6
SP  - 972-977
L1  - /bitstream/handle/11343/26207/115973_5024.pdf?sequence=1&isAllowed=n
ER  -